| 3131 Effect of Delayed Polishing on Gap Formation in Flowable Composites | ||
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M. IRIE, Okayama University, Graduate School of Medicine and Dentistry, Japan, and K. SUZUKI, Okayama University, Graduate School of Medicine and Dentistry, Japan Objectives: The purpose of this study was to evaluate the effect of polishing after one-day storage on the gap formation around Class V restorations with self-etching adhesives and flowable composites (Esthet-X Flow + EXP-1P-SEA-HL-1-203, Dentsply/Caulk (EX); Filtek Flow + Adper Prompt L-Pop, 3M ESPE (FL); Point 4 Flowable + OptiBond Solo Plus Self-Etch Adhesive, Kerr (P4); UniFil Flow + UniFil Bond , GC (UF); SI-BF2001-LF + FL-BOND, Shofu (SI). Methods: Class V cavity was placed in the premolars. A cylindrical cavity was prepared, having a diameter of 3.5 mm with a depth of 1.5 mm. The restorative procedure was performed according to the manufacturers' instructions. A restored tooth was polished and then sectioned in a mediodistal direction through the center of the restoration immediately (IM) and after one-day storage (1D). The presence or absence of gaps around a restoration was measured at 14 points (each 0.5 mm apart) along the cavity restoration interface (N=10, total points measured = 140, Oper Dent 2003; 28: 554). The number of gaps in each sample was totaled and expressed as the sum of each sample. The shear bond strength to enamel (SBS-E) was measured with the same materials under same conditions. Statistical analyses were done by Mann-Whitney U-test (in sum of gaps for all ten samples, p<0.05) and t-test (in SBS-E, p<0.05, N=10). Results: Sum of Gap Formation, SBS-E (Mean (SD), MPa) EX FL P4 UF SI IM 30a,9.7(1.6)c 28e,11.2(2.9)g 28i,8.8(2.8)k 32m,10.0(1.7)o 20q,13.3(1.8)r 1D 8b,20.9(3.4)d 17f,14.8(3.1)h 13j,13.5(3.7)l 16n,16.7(2.8)p 16q,21.6(2.8)s The same small letters are not significantly different. Conclusions: Delaying polishing for one-day resulted in improved gap formation for Class V restorations of flowable composites and the value of shear bond strength to enamel exhibited significant improvement. | ||
| Seq #335 - Adhesion III 10:15 AM-11:30 AM, Saturday, 13 March 2004 Hawaii Convention Center Exhibit Hall 1-2 | ||
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