3131 Effect of Delayed Polishing on Gap Formation in Flowable Composites
M. IRIE, Okayama University, Graduate School of Medicine and Dentistry, Japan, and K. SUZUKI, Okayama University, Graduate School of Medicine and Dentistry, Japan

Objectives: The purpose of this study was to evaluate the effect of polishing after one-day storage on the gap formation around Class V restorations with self-etching adhesives and flowable composites (Esthet-X Flow + EXP-1P-SEA-HL-1-203, Dentsply/Caulk (EX); Filtek Flow + Adper Prompt L-Pop, 3M ESPE (FL); Point 4 Flowable + OptiBond Solo Plus Self-Etch Adhesive, Kerr (P4); UniFil Flow + UniFil Bond , GC (UF); SI-BF2001-LF + FL-BOND, Shofu (SI). Methods: Class V cavity was placed in the premolars. A cylindrical cavity was prepared, having a diameter of 3.5 mm with a depth of 1.5 mm. The restorative procedure was performed according to the manufacturers' instructions. A restored tooth was polished and then sectioned in a mediodistal direction through the center of the restoration immediately (IM) and after one-day storage (1D). The presence or absence of gaps around a restoration was measured at 14 points (each 0.5 mm apart) along the cavity restoration interface (N=10, total points measured = 140, Oper Dent 2003; 28: 554). The number of gaps in each sample was totaled and expressed as the sum of each sample. The shear bond strength to enamel (SBS-E) was measured with the same materials under same conditions. Statistical analyses were done by Mann-Whitney U-test (in sum of gaps for all ten samples, p<0.05) and t-test (in SBS-E, p<0.05, N=10). Results: Sum of Gap Formation, SBS-E (Mean (SD), MPa) EX FL P4 UF SI IM 30a,9.7(1.6)c 28e,11.2(2.9)g 28i,8.8(2.8)k 32m,10.0(1.7)o 20q,13.3(1.8)r 1D 8b,20.9(3.4)d 17f,14.8(3.1)h 13j,13.5(3.7)l 16n,16.7(2.8)p 16q,21.6(2.8)s The same small letters are not significantly different. Conclusions: Delaying polishing for one-day resulted in improved gap formation for Class V restorations of flowable composites and the value of shear bond strength to enamel exhibited significant improvement.

Seq #335 - Adhesion III
10:15 AM-11:30 AM, Saturday, 13 March 2004 Hawaii Convention Center Exhibit Hall 1-2

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